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HI-200 查看數據表(PDF) - Intersil

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HI-200 Datasheet PDF : 10 Pages
1 2 3 4 5 6 7 8 9 10
Die Characteristics
METALLIZATION:
Type: CuAl
Thickness: 16kÅ ±2kÅ
Metallization Mask Layout
OUT 1
A1
21
IN 1
3
V-
4
GND
5
IN 4
6
OUT 4
78
A4
HI-200, HI-201
PASSIVATION:
Type: Nitride over Silox
Nitride Thickness: 3.5kÅ ±1kÅ
Silox Thickness: 12kÅ ±2kÅ
WORST CASE CURRENT DENSITY:
2 x 105 A/cm2 at 25mA
HI-201
A2
16 15
OUT 2
14
IN 2
13
V+
12
VREF
11
IN 3
9 10
OUT 3
A3
All Intersil U.S. products are manufactured, assembled and tested utilizing ISO9000 quality systems.
Intersil Corporation’s quality certifications can be viewed at www.intersil.com/design/quality
Intersil products are sold by description only. Intersil Corporation reserves the right to make changes in circuit design, software and/or specifications at any time without
notice. Accordingly, the reader is cautioned to verify that data sheets are current before placing orders. Information furnished by Intersil is believed to be accurate and
reliable. However, no responsibility is assumed by Intersil or its subsidiaries for its use; nor for any infringements of patents or other rights of third parties which may result
from its use. No license is granted by implication or otherwise under any patent or patent rights of Intersil or its subsidiaries.
For information regarding Intersil Corporation and its products, see www.intersil.com
10
FN3121.8
April 6, 2005

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